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Project information
Elementary processes in plasma pencil at atmospheric pressure under different conditions

Information

This project doesn't include Institute of Computer Science. It includes Faculty of Science. Official project website can be found on muni.cz.
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Project Identification
GA202/00/0843
Project Period
1/2000 - 1/2002
Investor / Pogramme / Project type
Czech Science Foundation
  • Standard Projects
MU Faculty or unit
Faculty of Science
  • prof. RNDr. Vratislav Kapička, DrSc.
Cooperating Organization
Charles University
  • Responsible person prof. RNDr. Miloš Šícha, DrSc.

High frequency (hf) plasma, which is now frequently used both in research and practical application, especially in plasmachemistry, has been generated in different gases almost at reduced pressure. Discharges burning in flowing gases at atmospheric press ure are less known and used. Recently, a completely new type of hf unipolar/bipolar discharge burning from a hollow electrode at atmospheric pressure in a working gas flowing through the electrode with input hf power up to 500 W and a plasmachemical devi ce for generation of such discharge, called plasma pencil, was developed at the Department (patent No. PV 1476-98 CZ). First results show that the discharge with similar properties can be generated at atmospheric pressure not only by hf generators by als o by means of dc, low frequency and microwave sources. Moreover, it was found that the plasma pencil can also work in liquid solution, which can be used for modification of surfaces (cleaning from corrosion, ablation, etching, deposition of thin films, e

Publications

Total number of publications: 7

2003

2002

2001

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