Experimental study of DC driven hybrid PVD-PECVD process

Warning

This publication doesn't include Institute of Computer Science. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	SCHMIDTOVÁ Tereza SOUČEK Pavel VAŠINA Petr
Year of publication	2012
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Evolution of basic deposition plasma parameters such as discharge voltage and current, total pressure and selected spectral emission line intensities as a function of acetylene supply flow is reported and correlated with the evolution of the state of the target.
Related projects:	Plazmochemické procesy a jejich technologické aplikace CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev