Magnetron sputtering at CEPLANT project
| Authors | |
|---|---|
| Year of publication | 2012 |
| Type | Article in Proceedings |
| Conference | Potential and Applications of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstracts |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | Magnetron sputtering |
| Description | Magnetron sputtering belongs to the most industrially attractive methods for thin film deposition. Magnetron cathodes can be produced several meters long which makes the method very suitable for large area deposition. We presents activity related to magnetron sputtering group performed within the CEPLANT project, research topics, current equipment as well as properties of the sputtering system which is being acquired as one of the core devices of the CEPLANT project. |
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