On sputtered particle distribution towards substrate during target erosion - simulation and experiment

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Authors	KLEIN Peter VAŠINA Petr SCHMIDTOVÁ Tereza
Year of publication	2013
Type	Article in Proceedings
Conference	PAPN 2013: Book of extended abstracts
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	Sputtering; Magnetron; Monte Carlo simulation; Compound material
Description	It is commonly observed that thin layers, especially formed by compound material deposited in planar magnetron using the same deposition manners, can have slightly different properties and composition. This research shows that one of the important factors to be considered thinking about fluxes of different species on the substrate is the target erosion state. Using Monte Carlo simulation optimal conditions for reproducibly depositing thin layer were calculated.
Related projects:	CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev