Pulsed-DC Magnetron Sputtering Process for Low Temperature Deposition of Hard Yet Moderately Ductile MoBC Coatings
| Authors | |
|---|---|
| Year of publication | 2016 |
| Type | Conference abstract |
| MU Faculty or unit | |
| Citation | |
| Description | Current state-of- materials nowadays used as protective coatings such as TiN, TiAlN, c-BN etc. generally exhibit high hardness and high stiffness. These positive features are often accompanied by undesirable brittle deformation behaviour. To overcome this limitation a new generation of materials with high hardness coupled with moderate ductility is desired. |
| Related projects: |