Probe technique for measurement of plasma potential waveform
| Authors | |
|---|---|
| Year of publication | 2017 |
| Type | Article in Periodical |
| Magazine / Source | Plasma Sources Science and Technology |
| MU Faculty or unit | |
| Citation | |
| Doi | http://dx.doi.org/10.1088/1361-6595/aa6611 |
| Field | Plasma physics |
| Keywords | plasma potential; probe |
| Description | A method for measurement of plasma potential waveforms is presented that is based on measurement with a high-impedance probe and on an electric model of the sheath around the probe. The method was verified and compared with methods that were previously used for measurement of the temporal development of plasma potential during a RF period of capacitive discharges. Sensitivity of the method to the values of required input parameters (mean plasma potential value, electron concentration and temperature) was analyzed and it was found that with a lower precision the method can be used even without the knowledge of these input parameters. Finally, plasma potential waveforms were measured in a low-pressure capacitively coupled discharge. In agreement with theoretical models, generation of higher harmonic frequencies of plasma potential and their sensitivity to electron concentration were observed. |
| Related projects: |