Titanium Atom and Ion Number Density Evolution in Reactive High Power Impulse Magnetron Sputtering

Warning

This publication doesn't include Institute of Computer Science. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	FEKETE Matej LUNDIN Daniel BERNÁTOVÁ Katarína KLEIN Peter HNILICA Jaroslav VAŠINA Petr
Year of publication	2018
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS, or it can even be entirely suppressed, which is beneficial for high-rate deposition of stoichiometric compound films. However, the main effect behind the hysteresis suppression is not yet completely understood. We report on evolutions of titanium atom, and ion ground state densities in R-HiPIMS discharges in oxygen for constant mean power and pulse duration, when varying the repetition frequency.
Related projects:	Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy