Ionised density fraction of sputtered species in HiPIMS discharge excited in argon/acetylene gas mixture
| Authors | |
|---|---|
| Year of publication | 2020 |
| Type | Conference abstract |
| MU Faculty or unit | |
| Citation | |
| Description | High power impulse magnetron sputtering (HiPIMS) technology attracts the interest of the industry as the coatings deposited by HiPIMS demonstrate improved properties compared to conventional dc magnetron sputtered (dcMS) coatings. This is because HiPIMS generates very dense plasma, which results in a large fraction of ionized sputtered particles. We report on the HiPIMS with titanium target in the argon atmosphere with an addition of acetylene gas. Such a process can be referred to either as hybrid PVD-PECVD [1] or non-saturated reactive process [2]. The non-invasive method called effective branching fraction method is utilized in order to evaluate the absolute ground state number densities of the sputtered titanium species for various flows of acetylene gas. Further, the HiPIMS process is modelled by a modified Berg model. The presented model incorporates the production of thick carbon layer at the target and the back-attraction of the sputtered titanium ions to the target. The simulated trends agree well with the measured ones. |
| Related projects: |