Analysis of thin films with slightly rough boundaries

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Authors	OHLÍDAL Ivan FRANTA Daniel HORA Jaroslav NAVRÁTIL Karel WEBER Jan JANDA Pavel
Year of publication	1998
Type	Article in Periodical
Magazine / Source	Mikrochim. Acta
MU Faculty or unit	Faculty of Science
Citation
Web	http://hydra.physics.muni.cz/~franta/bib/MA15_177.html
Field	Solid matter physics and magnetism
Keywords	Spectroscopic Ellipsometry; Spectroscopic Reflectometry; Atomic Force Microscopy
Description	In this paper presented method is based on a combination of variable angle spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy enabling us to determine the optical parameters and most significant statistical parameters of the rough boundaries characterizing the slightly rough single layers.
Related projects:	Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods