Antireflexní vrstva na substrátu ve specifikaci T&gt;=99,8 %@ 248 nm a T&gt;=98,5 % @ 213 nm.

Antireflexní vrstva na substrátu ve specifikaci T>=99,8 %@ 248 nm a T>=98,5 % @ 213 nm.

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Title in English	Antireflection coating on the substrate in specification: T>=99,8 % at 248 nm and T>=98,5 % at 213 nm.
Authors	PEKAŘ Václav BŘEZINA Jaromír ŠKODA David OHLÍDAL Ivan VOHÁNKA Jiří FRANTA Daniel FRANTA Pavel OHLÍDAL Miloslav ŠULC Václav KLAPETEK Petr HAVLÍČEK Marek
Year of publication	2020
MU Faculty or unit	Faculty of Science
Description	Antireflection coating layers fabricated in combination of high index Al2O3 and low index SiO2 materials with following specification in deep ultraviolet region, design 1: T>=99,8 % at 248 nm and design 2: T>=98,5 % at 213 nm
Related projects:	Realizace vrstevnatých systémů s požadovanými spektrálními závislostmi odrazivosti a propustnosti ve střední ultrafialové oblasti spektra