Plasmachemical Deposition of Thin Films

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Authors	JANČA Jan ZAJÍČKOVÁ Lenka
Year of publication	2000
Type	Article in Proceedings
Conference	4th Czech-Russian Seminar on Electrophysical and Thermophysical Processes in Low-Temperature Plasma
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	plasma chemical deposition; Thin Films. hard films; plasma polymers; diamond-like
Description	PECVD deposition of thin films in RF and MW plasma. Hard diamond-like carbon thin films. Transparent SiOx thin films. Polycrystalline diamond.
Related projects:	Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague Development and Industrialization of Novel Superhard Nanocrystalline Composite Wear Protective Coatings Research and development and industrializartion of novel super hard nanocrystalline materials Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate Hard and superhard coatings prepared by unconventional plasma processes Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates