Characterization of thin films non-uniform in optical parameters by spectroscopic digital reflectometry

Investor logo
Investor logo

Warning

This publication doesn't include Institute of Computer Science. It includes Faculty of Science. Official publication website can be found on muni.cz.
Authors

OHLÍDAL Ivan OHLÍDAL Miloslav KLAPETEK Petr ČUDEK Vladimír JÁKL Miloš

Year of publication 2003
Type Article in Periodical
Magazine / Source Proceedings of SPIE
MU Faculty or unit

Faculty of Science

Citation
Field Optics, masers and lasers
Keywords fims nonuniform in optical parameters; optical characterization
Description In this paper, a new optical method for characterizing nonuniform thin films is employed. For applying this method the special experimental arrangement containing CCD camera as a detector is used. Using this experimental arrangement the spectral dependences of the local reflectances are obtained. After treating these experimental data the distributions of the values of the local thicknesses and local refractive index along a large areas of the substrates of the nonuniform films are found. Moreover, it is shown that this method can be used to determine strong nonuniformities in both the optical parameters.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info