Electrical and dielectrical properties of SiOxHyCz thin films prepared by PECVD

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Authors	FRANCLOVÁ Jana BURŠÍKOVÁ Vilma
Year of publication	2005
Type	Article in Proceedings
Conference	Juniormat 05
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	Dielectrical properties; Frenkel-Poole conduction
Description	SiOxHyCz thin films prepared by PECVD of thickness about 100 - 500 nm were fabricated in the form of sandwich structures using Al electrodes, which show the Frenkel-Poole effect (enhanced conductivity at high electric field due to the lowering of the potential barrier donor-like centres), the value of the Frenkel-Poole field-lowering coefficient increased with the deposition time.
Related projects:	Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates