Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry
| Authors | |
|---|---|
| Year of publication | 2006 |
| Type | Article in Periodical |
| Magazine / Source | Czech. J. Phys. |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | plasma discharge; PECVD; ellipsometry; reflectometry; plasma |
| Description | Carbon polymer-like films were prepared using plasma enhanced chemical vapor deposition in pulsed regime in Ar-acetylene gas mixture. The optical characterization of these films was performed by variable angle spectroscopic ellipsometry and spectroscopic reflectometry. Within the characterization the thicknesses, spectral dependences of the refractive index and extinction coefficient, dispersion parameters and the root-mean-square values of the heights of boundary roughness were determined. Non-negligible differences between the dependences of the film thickness on the deposition time determined using the ellipsometric data on the one hand and reflectometric data on the other hand were observed. These differences were explained by the fact that the films exhibited other defects that were not included in their structural model. Sensitivity of the optical parameters of the films on UV irradiation was also observed. |
| Related projects: |