Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition
| Autoři | |
|---|---|
| Rok publikování | 2012 |
| Druh | Konferenční abstrakty |
| Fakulta / Pracoviště MU | |
| Citace | |
| Popis | Hybrid PVD-PECVD process of titanium sputtering in mixture of argon and acetylene combines aspects of both conventional techniques: sputtering of titanium target (PVD) and deposition from acetylene which acts as a source of carbon for polymerization (PECVD). This contribution reports and corelates both the properties of the deposited coating and the deposition process characteristics. nc-TiC/a-C:H coating with hardness and Young’s modulus over 40 GPa and 400 GPa respectively with adhesion in range HF0-HF1 on Ti coated HSS and WC were prepared. Hysteresis free and non-monotonous evolution of discharge voltage determines three characteristic zones of the process evolution with the acetylene supply. The evolution of discharge voltage was correlated with the evolution of the state of the target and OES. At zone I, for low acetylene supply, the discharge voltage and H line intensity increase and the initially pure Ti racetrack is getting covered by TiC. At zone II, for medium acetylene supply, the discharge voltage slightly decreases, H line intensity increases and the racetrack is covered mainly by TiC. At zone III, for high acetylene supply, discharge voltage sharply increases and H line intensity decreases and the racetrack is getting covered by C layer. Ti lines decrease in all three zones. The coating with the highest hardness was prepared at the conditions close to boundary between zone II and III. |
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