Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing
| Autoři | |
|---|---|
| Rok publikování | 2012 |
| Druh | Článek ve sborníku |
| Konference | Potential and Application of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstrakts 2012 |
| Fakulta / Pracoviště MU | |
| Citace | |
| Obor | Fyzika plazmatu a výboje v plynech |
| Klíčová slova | higher harmonics; RF discharge; plasma processing |
| Popis | Waveforms of discharges voltage and current and their changes due to changes of plasma parameters were studied recently. Mainly the sensitive reaction of Fourier components of discharge voltage to presence of deposited or etched thin films showed up as an useful diagnostic method of plasma processing. |
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