Atomic layer deposition on plasma pre-treated flexible polymer surfaces
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Rok publikování | 2016 |
Druh | Kapitola v knize |
Fakulta / Pracoviště MU | |
Citace | |
Popis | In this work, we deposited an ultra-thin layer of TiO2 by atomic layer deposition (ALD) with a low number of cycles, up to 100. This led to non-uniform film with thickness less than several nm. |
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