Project information
Deposition of thin films and surface modifications in silent and glow discharges at atmospheric pressure

Information

This project doesn't include Institute of Computer Science. It includes Faculty of Science. Official project website can be found on muni.cz.
Investor logo
Project Identification
GA202/02/0880
Project Period
1/2002 - 12/2004
Investor / Pogramme / Project type
Czech Science Foundation
MU Faculty or unit
Faculty of Science

The goal of the project is to prove the possibility of uniform plasma treatment of different polymers and deposition of silicon oxides, silicon nitrides and plasma polymers containing silicon in atmospheric pressure glow discharge. Both the filamentary (FDBD) and glow (GDBD) dielectric barrier discharges as well as the conditions of transition between them will be studied for various gas mixtures by electrical measurement, images recording with digital camera and optical emission spectroscopy. The effects of both will be compared as concern the treatment and the deposition. Similar comparison will be made between atmospheric and low pressure glow discharges. The treated surfaces and deposited thin films will be investigated by several characterisation techniques.

Publications

Total number of publications: 34


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