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Project information
Deposition of thin films in dielectric barrier discharges at atmospheric pressure

Information

This project doesn't include Institute of Computer Science. It includes Faculty of Science. Official project website can be found on muni.cz.
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Project Identification
GA202/06/1473
Project Period
1/2006 - 12/2008
Investor / Pogramme / Project type
Czech Science Foundation
  • Standard Projects
MU Faculty or unit
Faculty of Science
Keywords
deposition, thin films, barrier discharges

The goal of the project is the study of the thin film deposition in dielectric barrier discharges burning at atmospheric
pressure. For the deposition such types of discharges, which produce homogenneous plasma, will be selected, so that
deposited films can be homogenneous also. The posibilities of deposition of thin films with specific properties, eg.
hardness and abrasion resistance etc. will be studied. The properties of discharges will be characterised by electrical
measurements and optical emision spectroscopy. The prepared thin films will be studied by different diagnostics methods – the morfology of the surface will be studied by AFM and SEM, the chemical composition of films by XPS, FTIR and RBS, further the microhardness, the elastic modulus and the surface free energy will be measured.

Publications

Total number of publications: 20

2009

2008

2007

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