Spatially resolved spectroscopy of atmospheric pressure microwave plasma jet used for surface treatment

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Authors	POTOČŇÁKOVÁ Lucia HNILICA Jaroslav KUDRLE Vít
Year of publication	2013
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Material processing and modification by plasma enjoys ever increasing interest of industry. Mostly for the surface related applications, OH radical is the essential element that initiates the reactions and enhances hydrophilic properties of the surface. The information about its distribution in plasma can be a valuable clue for the most effective treatment. We have investigated OH band relative intensity 2D profiles in atmospheric pressure microwave plasma jet - surfatron - by means of optical emission spectroscopy (OES).
Related projects:	CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy