STUDY OF NITROGEN DOPED ORGANOSILICON PLASMA POLYMER THIN FILMS
| Authors | |
|---|---|
| Year of publication | 2017 |
| Type | Article in Proceedings |
| Conference | 8TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION (NANOCON 2016) |
| MU Faculty or unit | |
| Citation | |
| Keywords | thin films; hexamethyldisiloxane; PECVD; FTIR; XPS; AFM; nanoindentation |
| Description | Plasma polymerized hexamethyldisiloxane coatings have been attracting interest of many researches. Due to their properties, these materials have a great potential to succeed in large field of applications such as protective anti-scratch layers on plastic substrates, corrosion protection coatings, barrier films for pharmaceutical packaging etc. Functionalized organosilicon plasma polymers have been investigated for development of unique biomaterials. Addition of a suitable dopant during plasma polymerization is one of the ways to form specific functionalities modulating chemistry, physical properties as well as biocompatibility of the films. In the present work, low pressure RF capacitively coupled discharge was used to deposit organosilicon thin films with nitrogen-containing functional groups on single crystalline silicon substrates. Resulting plasma polymers were investigated by several methods aimed primarily at determination of chemical composition, surface microstructure and mechanical properties. The present study includes results of Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, confocal microscopy, atomic force microscopy and nanoindentation, and their comparison with respect to deposition parameters. |
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