Multi-hollow surface dielectric barrier discharge for plasma treatment of patterned silicon surfaces
| Authors | |
|---|---|
| Year of publication | 2019 |
| Type | Article in Periodical |
| Magazine / Source | Surfaces and Interfaces |
| MU Faculty or unit | |
| Citation | |
| Web | https://www.sciencedirect.com/science/article/pii/S2468023018303948?via%3Dihub |
| Doi | http://dx.doi.org/10.1016/j.surfin.2019.01.014 |
| Keywords | Multi-hollow surface DBD; Atmospheric plasma; Silicon; Oxidation; Effective working distance |
| Description | A novel mull-hollow surface dielectric barrier discharge (MSDBD) plasma source was used to generate atmospheric-pressure plasma in air. MSDBD generates plasma inside 105 holes within two parallel electrodes fully embedded inside robust alumina ceramics. The inner area of holes was also fully covered by the alumina ceramics and generated plasma was not in contact with high-voltage electrodes, which enables long-term stability of the electrode system and therefore practically "unlimited" lifetime. The MSDBD plasma was employed for modification of silicon surfaces at various distances ranging from 0.00 mm to 1.07 mm. The major advantage of the MSDBD plasma was in higher distances of the substrates from the ceramics surface. For instance, coplanar DBD enables effective distances ranging from 0.1 mm to 0.3 mm. A range of experimental techniques was employed to study the efficiency of MSDBD plasma treatment on silicon surface including surface energy measurement, X-ray photoelectron spectroscopy and Atomic force microscopy. It was found that silicon surfaces can be effectively modified by MSDBD plasma, even at a distance of 1 mm, allowing plasma treatment of patterned silicon surfaces used in various fields, e.g. microfluidics. |
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