Multi-hollow surface dielectric barrier discharge for plasma treatment of patterned silicon surfaces

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Publikace nespadá pod Ústav výpočetní techniky, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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KRUMPOLEC Richard RICHTER Vít ZEMÁNEK Miroslav HOMOLA Tomáš

Rok publikování 2019
Druh Článek v odborném periodiku
Časopis / Zdroj Surfaces and Interfaces
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://www.sciencedirect.com/science/article/pii/S2468023018303948?via%3Dihub
Doi http://dx.doi.org/10.1016/j.surfin.2019.01.014
Klíčová slova Multi-hollow surface DBD; Atmospheric plasma; Silicon; Oxidation; Effective working distance
Popis A novel mull-hollow surface dielectric barrier discharge (MSDBD) plasma source was used to generate atmospheric-pressure plasma in air. MSDBD generates plasma inside 105 holes within two parallel electrodes fully embedded inside robust alumina ceramics. The inner area of holes was also fully covered by the alumina ceramics and generated plasma was not in contact with high-voltage electrodes, which enables long-term stability of the electrode system and therefore practically "unlimited" lifetime. The MSDBD plasma was employed for modification of silicon surfaces at various distances ranging from 0.00 mm to 1.07 mm. The major advantage of the MSDBD plasma was in higher distances of the substrates from the ceramics surface. For instance, coplanar DBD enables effective distances ranging from 0.1 mm to 0.3 mm. A range of experimental techniques was employed to study the efficiency of MSDBD plasma treatment on silicon surface including surface energy measurement, X-ray photoelectron spectroscopy and Atomic force microscopy. It was found that silicon surfaces can be effectively modified by MSDBD plasma, even at a distance of 1 mm, allowing plasma treatment of patterned silicon surfaces used in various fields, e.g. microfluidics.
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