Plasma Deposition of Diamond-Like Protective Coating with Silicon Oxide Content
| Authors | |
|---|---|
| Year of publication | 2003 |
| Type | Article in Proceedings |
| Conference | 46th Annual SVC Technical Conference Proceedings |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | Wear/abrasion-resistant coatings; Plasma enhanced CVD; Stability properties; Residual film stress |
| Description | Amorphous diamond-like carbon films with various silicon and oxygen content were deposited by plasma-enhanced chemical vapor deposition technique. The films were prepared from the mixture of methane and hexamethyldisiloxane in rf capacitively coupled discharges. The optimum SiOx percentage in the DLC network at which the thermo-mechanical stability of the DLC films was improved was determined. |
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