Study of carbon films on silicon substrate

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Authors	JAŠEK Ondřej MATĚJKOVÁ Jiřina ELIÁŠ Marek REK Antonín FRGALA Zdeněk KADLEČÍKOVÁ Magdaléna
Year of publication	2005
Type	Article in Periodical
Magazine / Source	Material Science Forum
MU Faculty or unit	Faculty of Science
Citation
Web	http://www.scientific.net/default.cfm?pdf=1&issn=0255-5476&pg=1&ppg=21&paper=203&isbn=0-87849-964-4
Field	Plasma physics
Keywords	high resolution scanning microscopy; carbon nanostructures; diamond; nanotubes
Description	Carbon based films on silicon substrates have been studied by high resolution FE SEM equipped by an EDS analyzer. The first type are carbon nanotube (CNT) films prepared on Si/SiO2 substrates with Ni or Fe layers by radiofrequency plasma chemical vapor deposition. Dependence of nanotube films properties on Ni and Fe thickness and deposition conditions have been studied. The second type of films discussed are microcrystalline and nanocrystalline diamond films grown on pre-treated Si substrates by microwave plasma chemical vapor deposition (MPCVD). The pre-treatment was varied and its effect on diamond films was studied.
Related projects:	Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates