X-ray reflection study of early stages of Pt silicide formation
| Authors | |
|---|---|
| Year of publication | 2004 |
| Type | Article in Proceedings |
| Conference | 7th Bienal Conference on High Resolution X-ray Diffraction and Imaging, Book of abstracts |
| MU Faculty or unit | |
| Citation | |
| Field | Solid matter physics and magnetism |
| Keywords | silicidation; Pt; XRR |
| Description | X-ray reflection measured in-situ during annealing was used for studying of very early stages of silicide formation from Pt layer deposited on Si substrate. It was shown that interdiffusion betwen two components at temperatures slightly above 100degC which is much lower value than is reported for silicide creation observed by other experimental methods. |
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