Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge

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Authors	VALTR Miroslav KLAPETEK Petr BURŠÍKOVÁ Vilma OHLÍDAL Ivan FRANTA Daniel
Year of publication	2008
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of the common techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aim of this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.
Related projects:	Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges