Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge

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Authors	TRUNEC David ZAJÍČKOVÁ Lenka BURŠÍKOVÁ Vilma STUDNIČKA Filip SŤAHEL Pavel PRYSIAZHNYI Vadym PEŘINA Vratislav HOUDKOVÁ Jana NAVRÁTIL Zdeněk FRANTA Daniel
Year of publication	2010
Type	Article in Periodical
Magazine / Source	Journal of Physics D: Applied Physics
MU Faculty or unit	Faculty of Science
Citation
Web	http://iopscience.iop.org/0022-3727/43/22/225403/pdf/0022-3727_43_22_225403.pdf
Field	Plasma physics
Keywords	thin film deposition; atmospheric pressure discharge
Description	An atmospheric pressure dielectric barrier discharge burning in nitrogen with a small admixture of hexamethyldisiloxane (HMDSO) was used for the deposition of thin organosilicon films. The thin films were deposited on glass, silicon and polycarbonate substrates, and the substrate temperature during the deposition process was increased up to values within the range 25 - 150 C in order to obtain hard SiOx-like thin films.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface