Plasma treatment of silicon surface

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Authors	SKÁCELOVÁ Dana HANIČINEC Martin SŤAHEL Pavel ČERNÁK Mirko
Year of publication	2010
Type	Article in Proceedings
Conference	Potential and Applications of Thin Ceramic and Metal Coatings
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	silicon surface - dielectric barrier discharge - plasma treatment
Description	The contribution focuses on the plasma treatment of crystalline silicon surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure in an ambient air. By means of the contact angle measurements surface free energy was studied an by atomic force microscope (AFM) the surface roughness of silicon before and after plasma treatment was investigated.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Preparation of nano-films and nano-coatings on textiles using plasma surface treatment at atmospheric pressure