Project information
Plazmochemické procesy a jejich technologické aplikace
- Project Identification
- GD104/09/H080
- Project Period
- 1/2009 - 12/2012
- Investor / Pogramme / Project type
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Czech Science Foundation
- Doctor grants
- MU Faculty or unit
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Faculty of Science
- prof. RNDr. David Trunec, CSc.
- doc. RNDr. Antonín Brablec, CSc.
- Keywords
- plasmachemistry, electrical discharges, surface modification, deposition
- Cooperating Organization
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Institute of Plasma Physics of the ASCR, v. v. i.
- Responsible person doc. RNDr. Milan Hrabovský, CSc.
- Responsible person prof. RNDr. František Krčma, Ph.D.
- Responsible person doc. RNDr. Petr Ponížil, Ph.D.
Publications
Total number of publications: 77
2012
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Determination of metastable and ground state density by method of effective branching fractions in Ar, Ar-Ti plasma
Potential and Applications of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstracts, year: 2012
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Evaluation of composition, mechanical properties and structure of nc-TiC/a-C:H coatings prepared by balanced magnetron sputtering
Surface & Coatings Technology, year: 2012, volume: 211, edition: OCTOBER, DOI
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Experimental study of DC driven hybrid PVD-PECVD process
Year: 2012, type: Conference abstract
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Feedback system to control reactive magnetron sputtering
Potential and Applications of Surface Nanothreatment of Polymers and Glass, year: 2012
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Hybrid PVD-PECVD Process for Synthesis of Me/C Nanocomposite Coatings
Year: 2012, type: Conference abstract
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Langmuir Probe and Optical Emission Diagnostics of DC Cylindrical Magnetron
Year: 2012, type: Conference abstract
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Laser induced fluorescence of OH radicals in coplanar dielectric barrier discharge
PASNPG Book of Extended Abstracts, year: 2012
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Magnetic Properties of gamma-Fe2O3 Nanopowder Synthesized by Atmospheric Microwave Torch Discharge
Proceedings of the European Conference Physics of Magnetism 2011 (PM’11), year: 2012
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Modelling of Reactive Magnetron Sputtering with Focus on Changes in Target Utilization
Chemické listy, year: 2012, volume: 106, edition: S
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Monitoring and control of RF driven PVD, PECVD and etching plasmas using Fourier components of discharge voltages
Year: 2012, type: Conference abstract