Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process
| Authors | |
|---|---|
| Year of publication | 2008 |
| Type | Article in Proceedings |
| Conference | Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | higher harmonics; plasma; discharge; reactive sputtering; magnetron |
| Description | A new method to control whether a radio-freguency (RF) reactive sputtering deposition processes runs in a pre-adjusted experimental conditions was proposed. The frequency spectrum of the cathode voltage and of the voltage on an uncompensated probe immersed in the plasma was measured and it was proved, that some of the harmonics are extremely sensitive markers of the transition between the metallic and the compound mode of the RF sputtering. |
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