Experimental study of hybrid PVD-PECVD process of metallic target sputtering in argon and acetylene

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Authors	SCHMIDTOVÁ Tereza SOUČEK Pavel VAŠINA Petr
Year of publication	2011
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Hybrid PVD-PECVD process of titanium sputtering in argon and acetylene atmosphere combines aspects of both conventional techniques: sputtering of titanium target (PVD) and acetylene as a source of carbon fragments polymerization (PECVD). It has been used for deposition of nanocomposite material consisting of nanocrystallites of titanium carbide embedded in hydrogenated carbon matrix with good mechanical properties. The aim of this contribution is to describe and understand basic processes influencing the deposition process of such films by comparing the behaviour of basic discharge parameters on acetylene supply flow. Hybrid sputtering driven by DC power alone and together with RF substrate bias is studied.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition Plazmochemické procesy a jejich technologické aplikace CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy